发明名称 |
COMBUSTION CHEMICAL VAPOR DEPOSITION ON TEMPERATURE-SENSITIVE SUBSTRATES |
摘要 |
Method and apparatus for depositing film on flexible (plastic/metal) foil and/or temperature sensitive substrates (101) by combustion chemical vapor deposition (C-CVD). A substrate (101) is held in place to provide physical and conductive thermal contact between the substrate (101) and a substrate holder (102). The substrate holder (102) is cooled using a cooling fluid and the substrate (101) and burner are moved relative to each other as C-CVD takes place. Heating of the substrate (101) during C-CVD is controlled and deterioration by heating is avoided. The foil or substrate (101) is suitable, in particular, for use in flat and flexible displays.
|
申请公布号 |
US2010151130(A1) |
申请公布日期 |
2010.06.17 |
申请号 |
US20050720851 |
申请日期 |
2005.12.07 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS, N.V. |
发明人 |
AMMERLAAN JOHANNES A.M.;MAESSEN RALPH T.H.;WEIDL ROLAND |
分类号 |
C23C16/453 |
主分类号 |
C23C16/453 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|