发明名称 ROLL-TO-ROLL SPUTTER SYSTEM FOR COATING TWO SIDED SUBSTRATE
摘要 PURPOSE: A roll-to-roll sputter system for double side substrate evaporation is provided to reduce a processing time by simultaneously evaporating the both sides of a substrate using a top and a lower part sputter system. CONSTITUTION: A roll-to-roll sputter system for double side substrate evaporation comprises a roll-to-roll system, a plurality of top sputter systems, and a plurality of lower part sputter systems. The roll-to-roll system transfers the substrate(220) through roller to the work space. The top sputter system evaporates the upper side of substrate. The lower part sputter system evaporates the lower surface of substrate. The top sputter system and lower part sputter system.
申请公布号 KR20100065624(A) 申请公布日期 2010.06.17
申请号 KR20080124042 申请日期 2008.12.08
申请人 Z . TEC. CO., LTD. 发明人 KIM, BONG SUEG;KIM, HAN KI;YOON, JUNG SANG
分类号 C23C14/34 主分类号 C23C14/34
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