| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a film-carrier tape for mounting electronic components and a method of designing a photoresist pattern capable of suppressing the generation of difference of inner lead length and generation of a taper shape. SOLUTION: A method of designing a photoresist pattern designs a photoresist pattern 2a for forming an inner lead 6a. In the method, the photoresist pattern 2a has an inner lead pattern obtained by extending a pattern having the same shape as the inner lead 6a in a width direction, and a correction region pattern formed at a head end of the inner lead pattern. A hole 1 is formed in the correction region pattern, and a predetermined distance S is formed between the hole 1 and the head end of the inner lead pattern. COPYRIGHT: (C)2010,JPO&INPIT
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