| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid to a space adjacent to the substrate and/or the table. A liquid displacing device(20) displaces the liquid from the sensor and/or the target. The liquid displacing device comprises a gas knife device(21) which is connected to a fluid limited structure through an actuator(22). A gas exhausting pipe is composed in order to make the local gas flow to the sensor and/or the target.</p> |
| 申请公布号 |
KR20100066406(A) |
申请公布日期 |
2010.06.17 |
| 申请号 |
KR20090121424 |
申请日期 |
2009.12.08 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KNAAPEN THIJS EGIDIUS JOHANNES;BRULS RICHARD JOSEPH;VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA;JACOBS JOHANNES HENRICUS WILHELMUS;KAMPHUIS MARTIJN HENDRIK;LIEBREGTS PAULUS MARTINUS MARIA;MAAS RUDOLF ADRIANUS JOANNES;STAVENGA MARCO KOERT;VERSPAGET COEN CORNELIS WILHELMUS;PELLENS RUDY JAN MARIA;VAN DER HOEVEN JAN CORNELIS;ANSTOTZ DAVID LUCIEN;BRANDS GERT JAN GERARDUS JOHANNES THOMAS;VAN DER ZANDEN MARCUS JOHANNES;BADAM VIJAY KUMAR;DE GROOT CASPER RODERIK |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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