| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a copolymer for resist, having stabilized composition and properties. <P>SOLUTION: The method for producing the copolymer for resist includes polymerizing a (meth)acrylic monomer having an acetal group, and another (meth)acrylic monomer copolymerizable with the monomer in the coexistence of ≥0.016 pt.mass of a basic compound based on 100 pts.mass of the total of the monomers. The composition for resist contains the copolymer for the resist. A method for manufacturing a substrate having a pattern formed thereon includes: a step of forming a resist film by coating the composition, containing the resist composition and an optically acid-generating agent, on a substrate to be processed; a step of forming a latent image by irradiating the resist film with a light having a wavelength of ≤450 nm; and a step of carrying out a developing treatment of the resist film having the latent image formed therein with a developing solution. <P>COPYRIGHT: (C)2010,JPO&INPIT |
