| 摘要 |
<P>PROBLEM TO BE SOLVED: To maintain an excellent polarization state even when an illumination mode is changed in an exposure method using polarizing lighting. <P>SOLUTION: A projection exposure device has a switching means for polarization states and a switching means for effective light sources so as to generate illumination light corresponding to the pattern of a reticle. A lens barrel holding an optical element in a lighting optical system is rotated on an optical axis by a preset angle when the polarization states and effective light sources are alternated so as to prevent deterioration in polarization state. Consequently, the illumination light always passes through a part on the optical element where birefringence is held low, thereby holding an excellent polarization state. <P>COPYRIGHT: (C)2010,JPO&INPIT |
