发明名称 Illumination optical system, exposure apparatus, and exposure method
摘要 An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
申请公布号 US2010149511(A1) 申请公布日期 2010.06.17
申请号 US20100656822 申请日期 2010.02.17
申请人 发明人 TANITSU OSAMU;TANAKA HIROHISA;MURAMATSU KENICHI;KOMINE NORIO;NISHINAGA HISASHI;MATSUYAMA TOMOYUKI;KUDO TAKEHITO
分类号 G03B27/72;G03F7/20 主分类号 G03B27/72
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