发明名称 |
Illumination optical system, exposure apparatus, and exposure method |
摘要 |
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
|
申请公布号 |
US2010149511(A1) |
申请公布日期 |
2010.06.17 |
申请号 |
US20100656822 |
申请日期 |
2010.02.17 |
申请人 |
|
发明人 |
TANITSU OSAMU;TANAKA HIROHISA;MURAMATSU KENICHI;KOMINE NORIO;NISHINAGA HISASHI;MATSUYAMA TOMOYUKI;KUDO TAKEHITO |
分类号 |
G03B27/72;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|