| 摘要 |
<p>PURPOSE: A development processing method, a computer memory medium, and a development processing device are provided to enhance uniformity in the measurement of a resist pattern by uniformly implementing the developing process of a substrate inside the surface of the substrate. CONSTITUTION: A developing solution(D) is provided to the central part of a substrate(W) from a developing solution nozzle(33). The entire side of the substrate is covered with the developing solution. Deionized water(P) is provided to the central part of the substrate. The developing solution is pushed out from the entire side of the substrate. The substrate is developed by providing the developing solution to the substrate.</p> |
