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发明名称
A TWIN INTERNAL ION SOURCE FOR PARTICLE BEAM PRODUCTION WITH A CYCLOTRON
摘要
申请公布号
EP2196073(A1)
申请公布日期
2010.06.16
申请号
EP20090761635
申请日期
2009.05.29
申请人
ION BEAM APPLICATIONS S.A.
发明人
KLEEVEN, WILLEM;GHYOOT, MICHEL;ABS, MICHEL
分类号
H05H13/00
主分类号
H05H13/00
代理机构
代理人
主权项
地址
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