发明名称 POLISHING LIQUID FOR METAL AND METHOD OF POLISHING
摘要 A polishing liquid for metals which comprises a metal-oxide-dissolving agent, a metal-oxidizing agent, a metal anticorrosive, a water-soluble polymer having a weight-average molecular weight of 8,000 or higher and having an anionic functional group and a nonionic functional group, and water and which has a pH of 2.5-5.0. The polishing liquid for metals is effective in reducing the frictional force in polishing which generates during CMP, and is highly effective in flattening the surface of a work to be polished.
申请公布号 KR20100065304(A) 申请公布日期 2010.06.16
申请号 KR20107004408 申请日期 2008.07.28
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 NOMURA YUTAKA;FUKASAWA MASATO;NAKAGAWA HIROSHI
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
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