发明名称 Method of manufacturing semiconductor apparatus and method of forming viscous liquid layer
摘要 A method of manufacturing a semiconductor apparatus including a process of applying viscous liquid. The method applies viscous liquid onto a principal surface of a substrate, coats the viscous liquid closely with flexible coating material having a higher bonding strength with molecules of the viscous liquid than an intermolecular bonding strength of molecules of the viscous liquid, and then strips away the coating material together with part of the viscous liquid.
申请公布号 US7735717(B2) 申请公布日期 2010.06.15
申请号 US20050269552 申请日期 2005.11.09
申请人 NEC ELECTRONICS CORPORATION 发明人 HARA TOSHIYUKI
分类号 B23K1/20 主分类号 B23K1/20
代理机构 代理人
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