发明名称 Implantation of multiple species to address copper reliability
摘要 A first species and a second species are implanted into a conductor of a substrate, which may be copper. The first species and second species may be implanted sequentially or at least partly simultaneously. Diffusion of the first species within the conductor of the substrate is prevented by the presence of the second species. In one particular example, the first species is silicon and the second species is nitrogen, although other combinations are possible.
申请公布号 US7737013(B2) 申请公布日期 2010.06.15
申请号 US20080255181 申请日期 2008.10.21
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 YIN HEYUN;PAPASOULIOTIS GEORGE D.;SINGH VIKRAM
分类号 H01L21/00 主分类号 H01L21/00
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