发明名称 APPARATUS FOR TREATMENT OF PLURAL SUBSTRATES
摘要 <p>PURPOSE: An apparatus for processing a plurality of substrates is provided to improve yield by not re-controlling a transfer distance by including a fixing block which fixes a distance between a process chamber and a base frame. CONSTITUTION: A process chamber(120) receives a substrate transferred from a transfer chamber(110). The process chamber is connected to control the space with the transfer chamber by a space controller(150) in a thermal expansion process. A base frame(130) supports the process chamber on the lower side of the process chamber. A fixing block(140) is formed on the lower side of the process chamber and fixes the process chamber and the base frame therebetween.</p>
申请公布号 KR20100064802(A) 申请公布日期 2010.06.15
申请号 KR20080123404 申请日期 2008.12.05
申请人 INTEGRATED PROCESS SYSTEMS LTD. 发明人 HWANG, HUI;HEO, PIL WOONG
分类号 H01L21/677;H01L21/205 主分类号 H01L21/677
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