POLISHING PAD AND MANUFACTURING METHOD OF THE SAME

摘要

PURPOSE: A low-density and high-hardness polyeurethane grinding pad is provided to perform the precise and minute abrasion of a solid substance which is exposed to bubble. CONSTITUTION: A low-density and high-hardness polyeurethane grinding pad is as follows. Polyol component is stirred with additive component. Polyol component is produced by mixing polyol and copolymer, the abrasive component is mixed in a first mixed solution. Polyurethane prepolymer component is mixed with a second mixture. Polyurethane prepolymer component is synthesized with isocyanate and glycol. After a third mixture is inserted to a mold and is hardened and separated from a mold.