发明名称 METHOD OF MAKING SEMICONDUCTOR DEVICE
摘要 A method of making a semiconductor device includes a resin film forming step for forming a resin film on a semiconductor substrate 10 provided with electrode portions 11 to cover the electrode portions 11, an opening forming step for forming openings in the resin film at locations corresponding to the electrode portions 11, a loading step for loading a bump material in the openings, a bump forming step for forming bumps 41 in the openings by heating, and a removing step for removing the resin film.
申请公布号 KR100963372(B1) 申请公布日期 2010.06.15
申请号 KR20020070402 申请日期 2002.11.13
申请人 发明人
分类号 H01L23/48;H01L21/60 主分类号 H01L23/48
代理机构 代理人
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