发明名称 ACTUATOR SYSTEM, LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE POSITION OF A COMPONENT AND DEVICE MANUFACTURING METHOD.
摘要 An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.
申请公布号 NL2003751(A) 申请公布日期 2010.06.15
申请号 NL20092003751 申请日期 2009.11.04
申请人 ASML NETHERLANDS B.V., 发明人 VRIES, GOSSE;BUIS, EDWIN;MICKAN, UWE
分类号 G03F9/00;H01L21/68 主分类号 G03F9/00
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