发明名称 Electromechanical device treatment with water vapor
摘要 Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.
申请公布号 US7738158(B2) 申请公布日期 2010.06.15
申请号 US20080163660 申请日期 2008.06.27
申请人 QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 NATARAJAN BANGALORE R.;KHAZENI KASRA;HEALD DAVID;HE RIHUI;AKELLA SRIRAM;GOUSEV EVGENI
分类号 G02B26/00;G02F1/03 主分类号 G02B26/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利