发明名称 Trench junction barrier controlled Schottky device with top and bottom doped regions for enhancing forward current in a vertical direction
摘要 A Schottky diode includes at least a trenched opened in a semiconductor substrate doped with a dopant of a first conductivity type wherein the trench is filled with a Schottky junction barrier metal. The Schottky diode further includes one or more dopant region of a second conductivity type surrounding sidewalls of the trench distributed along the depth of the trench for shielding a reverse leakage current through the sidewalls of the trench. The Schottky diode further includes a bottom-doped region of the second conductivity type surrounding a bottom surface of the trench and a top-doped region of the second conductivity type surrounding a top portion of the sidewalls of the trench. In a preferred embodiment, the first conductivity type is a N-type conductivity type and the middle-depth dopant region comprising a P-dopant region.
申请公布号 US7737522(B2) 申请公布日期 2010.06.15
申请号 US20060541189 申请日期 2006.09.30
申请人 ALPHA & OMEGA SEMICONDUCTOR, LTD. 发明人 LUI SIK K;BHALLA ANUP
分类号 H01L29/47;H01L29/872 主分类号 H01L29/47
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