发明名称 |
Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device |
摘要 |
A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
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申请公布号 |
US7737044(B2) |
申请公布日期 |
2010.06.15 |
申请号 |
US20060599373 |
申请日期 |
2006.11.15 |
申请人 |
TOPPAN PRINTING CO., LTD. |
发明人 |
FUKUYOSHI KENZO;ISHIMATSU TADASHI;OGATA KEISUKE;NAKAO MITSUHIRO;UCHIBORI AKIKO |
分类号 |
H01L21/302;H01L21/461;H01L27/146 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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