| 摘要 |
A lithographic apparatus can include an illumination system that conditions a radiation beam, a patterning device that modulates the radiation beam, a substrate table that supports a substrate, and a projection system that projects the modulated radiation beam onto a target portion of the substrate. The lithographic apparatus can also include a substrate handler that loads and/or unloads a substrate on/from the substrate table. The substrate handler supports the substrate in a support plane and can include a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device can include a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.
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