| 摘要 |
<p>PURPOSE: A processing liquid supplying apparatus is provided to improve process efficiency by efficiently removing a gas dissolved in the processing liquid regardless of the kind of the processing liquid. CONSTITUTION: A buffer tank is connected to an atmosphere side. An N2 gas supply source and the buffer tank are connected through a gas supply pipeline. A circular pipeline(8) is comprised of a drain pipeline(7c) and a return pipeline(8a). The drain pipeline is connected to a filter. The return pipeline is branched from the drain pipeline and is connected to the supply pipeline between a chemical solution container and the buffer tank. A variable throttle(9) is installed on the circular pipeline and bubbles a gas dissolved in a resist liquid by reducing the hydraulic pressure of the resist liquid flowing in the circular pipeline.</p> |
