| 摘要 |
PURPOSE: Sulfonium salt, an acid generator, a resist material using thereof, a photomask blank, and a pattern formation method using thereof are provided to supply the resist material for a chemical amplification with the suitable high-resolution, and to improve the pattern profile after developing. CONSTITUTION: Sulfonium salt is marked with chemical formula 1. In the chemical formula 1, R1 refers to a linear, a branched, or a cyclic monovalent hydrocarbon group with the carbon number of 1~50 except for a vinyl group and an isoprophenyl group. R2, R3 and R4 are a substituted or non-substituted linear or branched alkyl group with the carbon number of 1~10, an alkenyl group, an oxoalkyl group, a substituted or non-substituted aryl group with the carbon number of 6~18, an aralkyl group, or an aryloxoalkyl group.
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