发明名称 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A TFT(Thin Film Transistor) substrate and a method for manufacturing the same are provided to applied to a high-speed driving and ultra high precise product by reducing the channel length thereof. CONSTITUTION: A drain electrode(66) and a source electrode(65) are formed at the upper and lower parts of a semiconductor pattern(40), and a gate electrode(26) is formed at the one side of the semiconductor pattern. The portion near the gate electrode in the semiconductor pattern forms a channel region(P), and the width of the channel region is proportion to a duplicated area between the drain electrode and the source electrode. The length of the channel region is determined by the thickness of the semiconductor pattern.
申请公布号 KR20100063493(A) 申请公布日期 2010.06.11
申请号 KR20080122039 申请日期 2008.12.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, HOON;LEE, YUN SEOK;KIM, JAE SUNG;JUNG, YANG HO;CHO, YOUNG JE;MAENG, CHEON JAE;LEE, WOOG EUN
分类号 G02F1/136;H01L29/786 主分类号 G02F1/136
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