发明名称 |
METHODS AND APPARATUS FOR A HYBRID CAPACITIVELY-COUPLED AND AN INDUCTIVELY-COUPLED PLASMA PROCESSING SYSTEM |
摘要 |
A capacitively-coupled plasma (CCP) processing system having a plasma processing chamber for processing a substrate is provided. The capacitively-coupled Plasma (CCP) processing system includes an upper electrode and a lower electrode for processing the substrate, which is disposed on the lower electrode during plasma processing. The capacitively-coupled Plasma (CCP) processing system also includes an array of inductor coils arrangement configured to inductively sustain plasma in a gap between the upper electrode and the lower electrode. |
申请公布号 |
KR20100063813(A) |
申请公布日期 |
2010.06.11 |
申请号 |
KR20107009162 |
申请日期 |
2008.09.29 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
MARAKHTANOV ALEXEI;BENJAMIN NEIL;HUDSON ERIC;DHINDSA RAJINDER |
分类号 |
H05H1/46;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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