发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A negative photosensitive resin composition, a method for producing an organic insulating film of a liquid crystal display device using the same, and the liquid crystal display device are provided to obtain excellent resolution, insulating property, flatness, and chemical resistance and to have superior sensitivity when the organic insulating film is formed. CONSTITUTION: A negative photosensitive resin composition comprises; an acrylic copolymer which is obtained through copolymerization of unsaturated carboxylic acid, unsaturated carbonic anhydride, a unsaturated compound containing an epoxy group, and an olefin-based unsaturated compound; a photoinitiator which is marked as a chemical formula 1; a multifunctional monomer having an ethylenic unsaturated bond; a silicon-based compound having the epoxy group or an amine group; and a solvent.
申请公布号 KR20100063540(A) 申请公布日期 2010.06.11
申请号 KR20080122100 申请日期 2008.12.03
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 KIM, BYUNG UK;YOUN, HYOC MIN;KIM, DONG MYUNG;CHOI, SANG GAK;KOO, KI HYUK;YEO, TAE HOON;YUN, JOO PYO;SHIN, HONG DAE;CHOI, SU YOUN;KIM, JIN SUN;LEE, SANG HOON
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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