| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which enables to form a resist pattern of good shape with small LWR and to provide a resist pattern forming method. <P>SOLUTION: The positive resist composition includes a base component (A) whose solubility in an alkali developer increases under the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a constitutional unit (a10) derived from a hydroxystyrene and a constitutional unit (a14) represented by a structure having an acid dissociable group in a side chain, in which two ester bonds are connected by a divalent linking group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
