发明名称 |
VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD |
摘要 |
A vapor deposition apparatus includes a linear head including a plurality of nozzles, and an angle controller controlling an inclined angle of the linear head. The angle of inclination of the linear head can be varied so as to position different portions of the linear head at different distances from the surface of a substrate.
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申请公布号 |
US2010143587(A1) |
申请公布日期 |
2010.06.10 |
申请号 |
US20090535568 |
申请日期 |
2009.08.04 |
申请人 |
LEE JOO-HYEON;CHUNG JIN-KOO;LEE SUNG-SOO |
发明人 |
LEE JOO-HYEON;CHUNG JIN-KOO;LEE SUNG-SOO |
分类号 |
C23C16/52;C23C16/44 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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