发明名称 Transistor and method of manufacturing the same
摘要 Example embodiments provide a transistor and a method of manufacturing the same. The transistor may include a channel layer formed of an oxide semiconductor and a gate having a three-dimensional structure. A plurality of the transistors may be stacked in a perpendicular direction to a substrate. At least some of the plurality of transistors may be connected to each other.
申请公布号 US2010140608(A1) 申请公布日期 2010.06.10
申请号 US20090458251 申请日期 2009.07.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK SUNG-HO;KIM CHANG-JUNG;SONG I-HUN;KIM SANG-WOOK;PARK JAE-CHUL
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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