发明名称 HAFNIUM AMIDE COMPLEX MANUFACTURING METHOD AND HAFNIUM-CONTAINING OXIDE FILM
摘要 <p>Disclosed is a method for manufacturing a hafnium amide complex represented by general formula: Hf(NR4R5)4, characterized in that a lithium alkylamide represented by general formula: Li(NR4R5) is added to a tertiary hafnium alkoxide complex represented by general formula: Hf[O(CR1R2R3)]4 and reacted, and then reduced-pressure distillation is performed. (In the formulas, R1, R2, and R3 independently represent either a phenyl group, a benzyl group, or a primary, secondary or tertiary alkyl group with carbon number 1-6; and R4 and R5 independently represent either a methyl group or an ethyl group. However, the case where all of R1, R2, and R3 are methyl groups, and the case where one of R1, R2, and R3 is an ethyl group and the other two are methyl groups are excluded.)</p>
申请公布号 WO2010064524(A1) 申请公布日期 2010.06.10
申请号 WO2009JP69157 申请日期 2009.11.11
申请人 CENTRAL GLASS COMPANY, LIMITED;RYOKAWA, ATSUSHI;YAMADA, SHUHEI 发明人 RYOKAWA, ATSUSHI;YAMADA, SHUHEI
分类号 C07C211/65;C07F7/00;C23C16/40 主分类号 C07C211/65
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