| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition useful as a chemically amplified resist satisfying excellent resolution, small LWR (Line Width Roughness), excellent pattern collapse resistance and excellent in non-defectiveness, and to provide a polymer usable as a resin component in the radiation-sensitive resin composition. <P>SOLUTION: The radiation-sensitive resin composition includes a resin (A) and a radiation-sensitive acid generator (B). The resin (A) is a polymer including a specific repeating unit (a-1) derived from a (meth)acrylic ester substituted by an oxyalkylene group having norbornane lactone at a terminal, a specific repeating unit (a-2) derived from a (meth)acrylic ester having a sulfonamide group, and a repeating unit (a-3) having an acid dissociable group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
