| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having both excellent application property and excellent ink repellency. <P>SOLUTION: The photosensitive resin composition contains a photopolymerizable compound (A), a photopolymerization initiator (B) and a fluorine-based surfactant (C). The fluorine-based surfactant (C) has a fluorinated alkenyl group and a lyophilic group in a side chain. A polymer with a mass average molecular weight of 5,000-30,000 is preferable as the fluorine-based surfactant (C), and a perfluoroalkenyl group is preferable as the fluorinated alkenyl group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
