发明名称 SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 When a step is delayed, an operator can be rapidly informed of the delay. A substrate processing apparatus comprises a process system configured to process a substrate, a control unit configured to control the process system for performing a plurality of steps, and a manipulation unit configured to monitor progresses of the steps. While the control unit waits for completion of a predetermined one of the steps after the control unit controls the process system to start the predetermined step, if a time elapsing from the start of the predetermined step exceeds an allowable time previously allocated to each of the steps, the control unit transmits an alarm message to the manipulation unit so as to report that the allowable time is exceeded.
申请公布号 US2010144145(A1) 申请公布日期 2010.06.10
申请号 US20090631152 申请日期 2009.12.04
申请人 HITACHI-KOKUSAI ELECTRIC INC. 发明人 TAKAHATA SATORU;OZAKI YUKIO;NUNOZAWA REIZO
分类号 H01L21/203;B05C11/00 主分类号 H01L21/203
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