发明名称 Optical system,exposure system, and exposure method
摘要 An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
申请公布号 US2010141926(A1) 申请公布日期 2010.06.10
申请号 US20100656636 申请日期 2010.02.05
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO
分类号 G03B27/32;G02B13/14;G02B17/08;G02B27/28;G03F7/20 主分类号 G03B27/32
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