| 摘要 |
<p>The present invention relates to a method for treating a metal element subjected to an ion beam, where: - the ions of the beam are selected from among boron, carbon, nitrogen, and oxygen; - the ion acceleration voltage, greater than or equal to 10 kV, and the power of the beam, between 1 W and 10 kW, as well as the ion load per surface unit are selected so as to enable the implantation of ions onto an implantation area with a thickness eI of 0.05 µm to 5 µm, and also enable the diffusion of ions into an implantation/diffusion area with a thickness eI + eP, of 0.1 µm to 1,000 µm; the temperature TZF of the area of the metal element located under the implantation/diffusion area is less than or equal to a threshold temperature TSD. In this manner, metal surfaces having remarkable mechanical characteristics are advantageously produced.</p> |
