| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an upper antireflection film for extending the depth of a focus, a composition for forming an upper antireflection film, and a pattern forming method using the upper antireflection film. <P>SOLUTION: The composition for forming an upper antireflection film contains (A) a polymer having a structural unit represented by formula (1), wherein R<SP>1</SP>denotes H or methyl, R<SP>2</SP>denotes a direct bond, -CH<SB>2</SB>-, -COO-A- or -CONH-A-, and A denotes a 1-8C divalent hydrocarbon group, (B) a tertiary amine compound having a hydroxyl group, and (C) water. <P>COPYRIGHT: (C)2010,JPO&INPIT |
