发明名称 METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR THIN FILM, AND METHOD OF MANUFACTURING THIN-FILM SOLAR CELL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a compound semiconductor thin film, and to provide a method of manufacturing a thin-film solar cell that have low manufacturing costs and give a small risk to a human body. <P>SOLUTION: The method of manufacturing a compound semiconductor thin film includes: a process for dissolving each chalcogenide of copper, indium, and gallium to a mixed solvent of an acid, and a thiol compound having a thiol group, and at least one of alkyl, aryl and aralkyl groups as functional groups to prepare a thiol complex containing the metal constituents; a process for manufacturing coating of the thiol complex by coating the surface of the substrate with the thiol complex for drying; and a process for forming a thin film with copper, indium, and gallium, and at least one of phosphor and selenium as main constituents on the surface of the substrate by heat-treating the coating of the thiol complex in a reducing atmosphere containing any one of hydrogen, nitrogen, and the mixed gas. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010129658(A) 申请公布日期 2010.06.10
申请号 JP20080300883 申请日期 2008.11.26
申请人 KYOCERA CORP 发明人 FUKUTOME MASATO;OKUMA TAKESHI;NISHIMURA TASUKE
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
主权项
地址