发明名称 MASK ALIGNMENT DEVICE AND SUBSTRATE TREATMENT APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask alignment device which can accurately align a mask with a substrate, and can surely prevent a film from sticking on a substrate holder and its peripheral part. Ž<P>SOLUTION: The mask alignment device includes: a plurality of struts 103 which rotate around each rotary axis arranged in a strut axis direction; a means of rotating the plurality of the struts 103 in the same direction and at the same angle while synchronizing them; and a means of detecting the quantity of deviation between the mask 701 and the substrate W. Support pins 101 which support the mask 701 are arranged on the upper surface parts of the plurality of the struts 103 so as to be deviated from the rotary axis of each of the struts by a predetermined distance. The mask 701 is aligned with the substrate W by an operation of rotating the plurality of the struts 103 in the same direction and at the same angle while synchronizing them, on the basis of the quantity of deviation between the mask 701 and the substrate W. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010126748(A) 申请公布日期 2010.06.10
申请号 JP20080300865 申请日期 2008.11.26
申请人 CANON ANELVA CORP 发明人 KANEKO KAZUAKI;HASEGAWA MASAMI
分类号 C23C14/50;C23C14/04;C23C16/04;H01L21/205;H01L21/31 主分类号 C23C14/50
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