| 摘要 |
PURPOSE: A plasma processing apparatus and an operation method of the same are provided to perform a control operation which changes the output power of a high frequency power by calculating the power value of the reflection wave which is reflected form the high frequency power. CONSTITUTION: A high frequency power(21) outputs high frequency. A high frequency power unit(2) comprises power control units(211, 311) and a reflected wave measurement unit. The power control units control the supply of the high frequency power. The reflected wave measurement unit measures the power value of the reflected wave which is reflected from the high frequency power. A timing signal generation part(22) applies timing signal to the power control units for an output enlargement.
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