| 摘要 |
PURPOSE: A plasma processing apparatus is provided to reduce a contamination of an object by controlling a roll up of an attachment by created in the plasma processing. CONSTITUTION: A stage(3) is arranged inside a processing container(20). The stage loads the processed object. A lower rectification wall(52) is arranged on the stage. An upper rectification wall(51) is loaded on the lower rectification wall. The upper rectification wall surrounds the object of the stage with the lower rectification wall. An elevating mechanism boards-alights the upper rectification wall.
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