| 摘要 |
PURPOSE: A power monitoring apparatus for a remote plasma system is provided to prevent defects in a semiconductor device due to an incomplete cleaning operation by monitoring the output power value of the remote plasma system in real time. CONSTITUTION: A remote plasma system(20) is connected with a detector(30) through a power connector(21). The detector is connected with an external power through a power line(50). An output power detector is connected with the power connector of the remote plasma system. The output power detector detects the output power value of the remote plasma system in a plasma source generation process. A control unit indicates the output power value of the remote plasma system in real time. A computer sets the upper limit and the lower limit of the output power value.
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