发明名称 |
MAGNETRON PLASMA PROCESSING APPARATUS |
摘要 |
A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.
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申请公布号 |
US2010140085(A1) |
申请公布日期 |
2010.06.10 |
申请号 |
US20100705486 |
申请日期 |
2010.02.12 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SATO HIDENORI;HAYASHI DAISUKE |
分类号 |
C25F3/02;H01J37/32;H01L21/306 |
主分类号 |
C25F3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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