发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
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申请公布号 |
US2010141918(A1) |
申请公布日期 |
2010.06.10 |
申请号 |
US20100709151 |
申请日期 |
2010.02.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MARIE DIERICHS MARCEL MATHIJS THEODORE;LAAN HANS VAN DER;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE |
分类号 |
G03B27/72;G03B27/54;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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