| 摘要 |
<P>PROBLEM TO BE SOLVED: To store a substrate for a long time while suppressing contamination of the substrate. Ž<P>SOLUTION: The storage device 3 includes a housing vessel 110 which houses a plurality of wafers W vertically in multistage and tightly seals an inside. A diffusion plate 120 is provided in the housing vessel 110 to cover above the plurality of wafers W. A plurality of through-holes 121 penetrating through the diffusion plate 120 in the thickness direction are formed on the diffusion plate 120. The diffusion plate 120 can uniformly diffuse inert gas supplied from an air supply opening 130 in a horizontal plane. The air supply opening 130 supplying the inert gas to an air supplying area A1 is formed on a lower surface of the housing vessel 110 in a flow channel R. An exhaust port 132 for exhausting the atmosphere in the housing vessel 110 from an exhaust area A3 is formed on a lower surface of the housing vessel 110 in an exhaust area A3. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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