发明名称 |
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS |
摘要 |
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
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申请公布号 |
US2010141912(A1) |
申请公布日期 |
2010.06.10 |
申请号 |
US20100703068 |
申请日期 |
2010.02.09 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
EHRMANN ALBRECHT;WEGMANN ULRICH;HOCH RAINER;MALLMANN JOERG;SCHUSTER KARL-HEINZ;LOERING ULRICH;GRUNER TORALF;KNEER BERNHARD;GEUPPERT BERNHARD;SORG FRANZ;KUGLER JENS;WABRA NORBERT |
分类号 |
G03B27/52;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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