摘要 |
Phosphorous-comprising dopants, methods for forming phosphorous-doped regions in a semiconductor material, and methods for fabricating phosphorous-comprising dopants are provided. In one embodiment, a phosphorous-comprising dopant comprises a phosphorous source comprising a phosphorous-comprising salt, a phosphorous-comprising acid, phosphorous-comprising anions, or a combination thereof, an alkaline material, cations from an alkaline material, or a combination thereof, and a liquid medium. |
申请人 |
HONEYWELL INTERNATIONAL INC.;HUANG, HONG, MIN;GAO, CAROL;DING, ZHE;PENG, ALBERT;LIU, YA, QUN |
发明人 |
HUANG, HONG, MIN;GAO, CAROL;DING, ZHE;PENG, ALBERT;LIU, YA, QUN |