发明名称 |
MANUFACTURING METHOD FOR DISPLAY DEVICE |
摘要 |
<p>PURPOSE: A manufacturing method of a display device for enhancing productivity with the low cost and high efficiency is provided to reduce the un-uniformity of silicon crystallization by using a mask and line beam. CONSTITUTION: An amorphous silicon is formed on a substrate(110). The substrate is arranged on the stage. A formed amorphous silicon is crystallized as a polycrystalline silicon by using the mask and the line beam. The line beam is formed by an IR(Infrared Ray) laser. The line beam is scanned in a right direction or left direction of X axis. The line beam is moved from upward and downward of the y-axis. The line beam is performed in a sequential scanning method.</p> |
申请公布号 |
KR20100062029(A) |
申请公布日期 |
2010.06.10 |
申请号 |
KR20080120432 |
申请日期 |
2008.12.01 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
KIM, SUNG KI;LEE, HONG KOO |
分类号 |
G02F1/136;G02F1/13;H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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