发明名称 MANUFACTURING METHOD FOR DISPLAY DEVICE
摘要 <p>PURPOSE: A manufacturing method of a display device for enhancing productivity with the low cost and high efficiency is provided to reduce the un-uniformity of silicon crystallization by using a mask and line beam. CONSTITUTION: An amorphous silicon is formed on a substrate(110). The substrate is arranged on the stage. A formed amorphous silicon is crystallized as a polycrystalline silicon by using the mask and the line beam. The line beam is formed by an IR(Infrared Ray) laser. The line beam is scanned in a right direction or left direction of X axis. The line beam is moved from upward and downward of the y-axis. The line beam is performed in a sequential scanning method.</p>
申请公布号 KR20100062029(A) 申请公布日期 2010.06.10
申请号 KR20080120432 申请日期 2008.12.01
申请人 LG DISPLAY CO., LTD. 发明人 KIM, SUNG KI;LEE, HONG KOO
分类号 G02F1/136;G02F1/13;H01L29/786 主分类号 G02F1/136
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