发明名称 INTERFEROMETER SYSTEM, STAGE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an interferometer system capable of obtaining an accurate speed of a moving body, a stage device, an exposure apparatus and a device manufacturing method. <P>SOLUTION: The system includes: a first wave guide part, having a first refractive index, fixed on a moving body; a second wave guide part having a second refractive index different from the first refractive index, fixed on the moving body; an interference part for causing a first electromagnetic wave passing through the first wave guide part, to interfere with a second electromagnetic wave passing through the second wave guide part, having the same wavelength as that of the first electromagnetic wave; a detecting device for detecting the phase difference between the first electromagnetic wave and the second electromagnetic wave, by using the interference wave generated in the interference part; and a speed-obtaining device for obtaining information regarding the moving speed of the moving body by using the sensed phase difference. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010129780(A) 申请公布日期 2010.06.10
申请号 JP20080302942 申请日期 2008.11.27
申请人 NIKON CORP 发明人 ARAI MASARU
分类号 H01L21/027;G01B9/02;G01P3/36;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址