| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition method of an amorphous hard carbon film capable of obtaining the amorphous hard carbon film having higher hardness compared with the former, with hydrocarbon-based gas under the atmospheric pressure being raw material thereof, and to provide a film deposition apparatus therefor. <P>SOLUTION: The film deposition method of the amorphous hard carbon film includes a base material holding step of holding a base material to a holding electrode, and a film deposition step of depositing the amorphous hard carbon film on a surface of the base material by applying the AC voltage to an application electrode, generating the glow discharge plasma between an electrode body and surface of the base material, and exhausting exhaust gas while the electrode body having the application electrode is opposite to the holding electrode, raw material gas containing hydrocarbon based gas is fed between the electrode body and the holding electrode, and the DC bias voltage is generated between the electrode body and the holding electrode. <P>COPYRIGHT: (C)2010,JPO&INPIT |
