CRYSTAL NUCLEUS MASK, METHOD OF MANUFACTURING CRYSTAL NUCLEUS MASK, METHOD OF MANUFACTURING POLYCRYSTAL SILICON LAYER, SEMICONDUCTOR DEVICE, AND ELECTRO-OPTIC DEVICE

摘要

PROBLEM TO BE SOLVED: To solve a problem wherein it is difficult to press and transcribe a catalyst substance on anα-Si layer having an area larger than a single crystal silicon substrate with a diameter up to 30 cm by using a transcription substrate when a crystal nucleus mask for attaching a catalyst substance for facilitating crystal nucleus formation onα-Si as dots, is formed, in which the single crystal silicon substrate is used to form a projected structure along a crystal surface and the catalyst substance is attached on its end. SOLUTION: The crystal nucleus mask 1 is structured by irradiating theα-Si layer on a glass substrate 10 with an excimer laser beam to arrange a projection part 13 having regular alignment, and forming a catalyst metal layer to cover the projection part 13. The glass substrate 10 having a diagonal longer than 1 m is easily available. Thus, the catalyst substance for facilitating the crystal nucleus formation is attached on theα-Si as dots on a large (a diagonal of approximately 1 m) substrate 21 to be transcribed. COPYRIGHT: (C)2010,JPO&INPIT