发明名称 |
PLATING APPARATUS AND PLATING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plating apparatus and a plating method in which the stain of a base body is efficiently removed while suppressing the warpage of the base body in plating. Ž<P>SOLUTION: The plating apparatus is equipped with a holding plate 12 for holding the base body on which a plating layer is formed, a plating liquid supply part 50 for supplying a plating liquid 22 to the base body 10 and a heating means 18 for heating a second surface 38 opposed to a first surface 36 of the base body 10 to be plated at a temperature higher than that of the plating liquid 22 to form the plating layer on the surface of the base body. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010126767(A) |
申请公布日期 |
2010.06.10 |
申请号 |
JP20080302871 |
申请日期 |
2008.11.27 |
申请人 |
PANASONIC CORP |
发明人 |
TAKESHITA MITSUHIRO;EGUCHI MUNEHIRO;MAKI SEIICHIRO |
分类号 |
C25D21/02;C25D7/12;C25D17/00;C25D17/06 |
主分类号 |
C25D21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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