发明名称 PLATING APPARATUS AND PLATING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a plating apparatus and a plating method in which the stain of a base body is efficiently removed while suppressing the warpage of the base body in plating. Ž<P>SOLUTION: The plating apparatus is equipped with a holding plate 12 for holding the base body on which a plating layer is formed, a plating liquid supply part 50 for supplying a plating liquid 22 to the base body 10 and a heating means 18 for heating a second surface 38 opposed to a first surface 36 of the base body 10 to be plated at a temperature higher than that of the plating liquid 22 to form the plating layer on the surface of the base body. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010126767(A) 申请公布日期 2010.06.10
申请号 JP20080302871 申请日期 2008.11.27
申请人 PANASONIC CORP 发明人 TAKESHITA MITSUHIRO;EGUCHI MUNEHIRO;MAKI SEIICHIRO
分类号 C25D21/02;C25D7/12;C25D17/00;C25D17/06 主分类号 C25D21/02
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